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Figure 1
(a) Schematic illustration of the set-up used for hard X-ray direct patterning. A synchrotron hard X-ray beam focused by a FZP illuminates a sample through a sectioned multilayer mask. (b) SEM image of a sectioned multilayer mask with 100 nm period. The dark region is transparent Si and the bright region is opaque WSi2. (c) Simulated X-ray wavefield downstream of the mask.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 22| Part 1| January 2015| Pages 156-160
https://doi.org/10.1107/S1600577514023534
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