Direct-write X-ray lithography using a hard X-ray Fresnel zone plate

Lee, S.Y.; Noh, D.Y.; Lee, H.C.; Yu, C.-J.; Hwu, Y.; Kang, H.C.

doi:10.1107/S1600577515003306

Journal of Synchrotron Radiation Journal of
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Figure 3
Variation in spot size as a function of the exposure for (a) sapphire(0001) and (b) Si(001) substrates. The slope of the linear fits represents the X-ray exposure sensitivity. The error bar indicates the standard deviations for a given set of spots.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 3| May 2015| Pages 781-785

https://doi.org/10.1107/S1600577515003306

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