Direct-write X-ray lithography using a hard X-ray Fresnel zone plate

Lee, S.Y.; Noh, D.Y.; Lee, H.C.; Yu, C.-J.; Hwu, Y.; Kang, H.C.

doi:10.1107/S1600577515003306

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

IUCr IT WDC

home archive editors for authors for readers submit subscribe open access

view article

Figure 4
SEM images showing 10 × 10 spot arrays produced with exposure of (a) 1.2, (b) 1.3, (c) 1.4 and (d) 1.6 s. Scale bars represent 200 nm. (e) Plot of the vertical and horizontal size of spots located within the sixth row, as indicated by the yellow arrows in (d).

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 22| Part 3| May 2015| Pages 781-785

https://doi.org/10.1107/S1600577515003306

Follow J. Synchrotron Rad.

Search IUCr Journals		doi		Advanced search
Author		volume	page