Figure 5
(a) X-ray diffraction patterns acquired for 100 s exposure corresponding to the same sample: prior to the heat treatment (black line) and after it (red line). (b) X-ray diffraction patterns acquired every 10 s for the sample measured at 1 K s−1. The patterns obtained every 10 K from 540 to 640 K are stacked vertically to show the evolution of the Pd2Si structure formation with temperature. (c) X-ray diffraction patterns acquired for 100 s exposure after the thermal treatment carried out at three different heating rates: 0.1 (black line), 1 (red line) and 10 K s−1 (blue line). |