Figure 1
Schematic of the portion of the limiting sphere to illustrate the allowed symmetric reflections for GaAs grown on (001) Si substrates. Here, the [110] direction lies in the growth plane. The limiting sphere governed by the wavelength of the laboratory X-ray source (Cu Kα1) is shown by a dashed line (red) whereas the limiting sphere governed by the wavelength of synchrotron radiation is shown by a solid line (green). Note that the (008) reflection (red filled circle) is accessible only when HRXRD measurements are performed at the synchrotron radiation source. At 15.5 keV energy a few more reflections are accessible. However, the reflections only up to (008) are shown here for simplicity. ω is defined as the angle which the incident X-ray beam makes with the sample surface while 2θ is the angle between the incident and diffracted X-ray beams. |