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![[Figure 2]](xn5001fig2mag.jpg)
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Figure 2
SEM images of (a) patterned silicon substrate and (b) holes filled with P46 phosphors. No significant damage has been observed on the silicon substrate after the fabrication process. |
![[Figure 2]](xn5001fig2.jpg)
 | JOURNAL OF SYNCHROTRON RADIATION |
ISSN: 1600-5775
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Figure 2
SEM images of (a) patterned silicon substrate and (b) holes filled with P46 phosphors. No significant damage has been observed on the silicon substrate after the fabrication process. |
| JOURNAL OF SYNCHROTRON RADIATION |
