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Figure 2
`Wafer bender'. (a) Overall sketch of the device in which the wafer is placed and bent. (b, c) Details of the working principle for the calculation of the curvature radius, required for the desired energy range.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 23| Part 3| May 2016| Pages 769-776
doi:10.1107/S1600577516003969
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