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Figure 1
Schematic diagram of the experimental arrangement used. The primary (high-heat-load) slits and in vacuo filter vessel are located in hutch 1A and centred at 13.9 and 14.7 m from the source (SCMPW), respectively. In hutch 1B the (in vacuo) secondary slits are centred at 19.8 m, the rotatable ex vacuo filter stage is at 22.0 m, and the IC is at 23.6 m. The `filter angle' (φ) is defined as the angle between the X-ray beam direction and the normal to the plane of the filter. We also implicitly assume that both of these directions lie in the horizontal plane. The DCLM is also shown, centred at 16.2 m and located in hutch 1A. When the DCLM is translated vertically into the beam the resulting doubly diffracted, monochromatic beam is offset by 20 mm and so downstream components must be raised by 20 mm too. Further details are provided in the text. |