journal menu
![[Figure 2]](yn5023fig2mag.jpg)
|
|
Figure 2
Resist removal in 200 µm-thick PMMA foils exposed to white light of 2 kJ cm−3, 4 kJ cm−3 or 6 kJ cm−3, as a function of development time. |
![[Figure 2]](yn5023fig2.jpg)
 | JOURNAL OF SYNCHROTRON RADIATION |
ISSN: 1600-5775
|
|
|
Figure 2
Resist removal in 200 µm-thick PMMA foils exposed to white light of 2 kJ cm−3, 4 kJ cm−3 or 6 kJ cm−3, as a function of development time. |
| JOURNAL OF SYNCHROTRON RADIATION |
