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Figure 8
A normal Fresnel zone plate with 1:1 line:space ratio (a) can be constructed by interlacing two fabrication processes, either on the same side of a thin window (Chao et al., 2005BB4) (b) or on opposite sides (Mohacsi et al., 2017BB23) (c). Both of those interlaced processes reduce the limitations produced by the proximity effect in electron beam lithography in the separate fabrication processes. The proximity effect is reduced further if one fabricates zones with a line:space ratio of 1:3 and uses them in the second diffraction order. One can also use complementary zone plates with an opposite pattern of material-filled/open zones. That leads to several options in zone plate stacking: stacking with 1:3 line:space ratio with a regular (d) or complementary (e) second zone plate, or with 1:1 line:space ratio with a regular (f) or complementary second zone plate. These various combinations give different properties for focusing efficiency and focal spot sidelobes, as shown in Fig. 9[link].

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 25| Part 4| July 2018| Pages 1048-1059
https://doi.org/10.1107/S1600577518007208
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