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Figure 7
Exposure results of the XIL beamline: (a) line structures with a period of 140 nm on the user's molecular glass photoresist obtained by adopting a two-grating mask with a grating period of 280 nm. (b) Periodic nanoholes with a period of 200 nm on the PMMA photoresist obtained by adopting a four-grating mask with a grating period of 280 nm.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 25| Part 6| November 2018| Pages 1869-1876
https://doi.org/10.1107/S1600577518012833
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