Silicon carbide X-ray beam position monitors for synchrotron applications

Nida, S.; Tsibizov, A.; Ziemann, T.; Woerle, J.; Moesch, A.; Schulze-Briese, C.; Pradervand, C.; Tudisco, S.; Sigg, H.; Bunk, O.; Grossner, U.; Camarda, M.

doi:10.1107/S1600577518014248

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 5
(a) Influence of the bias on collection efficiency for a beam position under the electrodes. The inset shows the device architecture (not drawn to scale). (b) Influence of the bias on position sensitivity.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 1| January 2019| Pages 28-35

https://doi.org/10.1107/S1600577518014248

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