A statistical approach to correct X-ray response non-uniformity in microstrip detectors for high-accuracy and high-resolution total-scattering measurements

Kato, K.; Tanaka, Y.; Yamauchi, M.; Ohara, K.; Hatsui, T.

doi:10.1107/S1600577519002145

Journal of Synchrotron Radiation Journal of
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Figure 5
Intensity distribution of SiO₂ glass from channels 14500 and 15000 at each step. (a) The uncorrected, (b) first-step, (c) second-step, (d) third-step, (e) fourth-step and (f) fifth-step distributions. The Poisson distribution is also plotted for comparison.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 3| May 2019| Pages 762-773

https://doi.org/10.1107/S1600577519002145

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