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Figure 4
(a) A representative X-ray reflectivity profile of a nanoporous PMSSQ film imprinted with 10 wt% mPCL6. The symbols are the measured data and the solid line represents the fit curve assuming a homogeneous electron density distribution within the film except for a thin surface layer, in which the electron density is slightly different. The inset shows a magnification of the region around the two critical angles: θc,film is the critical angle of the film and θc,Si is the critical angle of the Si substrate. (b) A model of the electron density distribution across the film thickness between the silicon substrate and air, which gives the best fit for the XR profile in (a).

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 40| Part s1| December 2007| Pages s626-s630
doi:10.1107/S0021889806047509
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