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Figure 8
Diffraction lines of affected and unaffected reflections of the Ni(W)–wafer film (at different tilt angles, Ψ) with normalized peak maximum intensity. The affected reflections are asymmetric and remarkably broader than the unaffected reflections.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 47| Part 1| February 2014| Pages 291-302
doi:10.1107/S1600576713030756
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