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Figure 1 Rietveld refinement for OAp employing synchrotron radiation data. Observed (crosses), calculated (solid line) and difference (bottom trace) plots are represented. Vertical marks correspond to the allowed Bragg reflections for OAp (first row) and SiO2 (second row).

Journal logoCRYSTALLOGRAPHIC
COMMUNICATIONS
ISSN: 2056-9890
Volume 65| Part 5| April 2009| Page i33
doi:10.1107/S1600536809011866
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