Journal of Applied Crystallography
Journal of Applied
Crystallography
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Figure 4
Log–log plot of maximum intensity versus
, in-plane crystal coherence length for Cu/Nb co-sputtered films.
JOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 58
|
Part 6
|
December 2025
|
Pages 1995-2005
https://doi.org/10.1107/S1600576725008131
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