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Figure 2
(Top) Schematic of the geometry and positioning of the sample, consisting of a Si wafer (black) and the Au island (yellow), in the beam. Shown are three different z positions of the sample, 250 nm apart, as indicated by the arrows. (Bottom) Corresponding intensity maps of the reflected signal at θ = 1.8° mapped in the surface xy plane. The white dots indicate the nominal position of the X-ray beam with the size corresponding to the nominal footprint along x of approximately 3 µm (that along y is exaggerated for clarity).

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APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
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