view article
Figure 4
XRR from a 10 × 10 µm Au island on a macroscopic Si wafer and from the bare substrate. The measured data from the Au island (open green symbols) are shown together with simulated Fresnel curves for the interfaces Si/vacuum and Au/vacuum (dashed lines), thereby taking into acount that the 90 × 90 nm beam is only partly reflected from the island for small angles. Both Gaussian (dash) and Lorentzian (dash–dot) beam profiles are evaluated (see text for more details). Their combined reflectivity is shown as a black solid line. A fit to the data, starting from [2\theta] = 0.55° omitting the lower angles, and using a slab model consisting of a Au layer on a Si substrate, is also shown (blue). The XRR curve for the bare substrate, measured just beside the Au island, is shown as well (red asterisks), along with a fit (red). The inset shows the resulting (electron) scattering density profiles as obtained from the fitting procedures for the Au island (blue) and the bare Si substrate (red).

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 58| Part 6| December 2025| Pages 1978-1985
https://doi.org/10.1107/S1600576725008179
Follow J. Appl. Cryst.
Sign up for e-alerts
E-alerts
Follow J. Appl. Cryst. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS