Measurements and scaling of X-ray total scattering from single crystals

Gorfman, S.; Eremenko, M.; Krayzman, V.; Bosak, A.; Zavalij, P.Y.; L., I.

doi:10.1107/S1600576726006187

Journal of Applied Crystallography Journal of Applied
Crystallography

IUCr IT WDC

home archive editors for authors for readers submit subscribe open access

view article

Figure 8
Dependence of reflection intensities on the primary-beam monitor value B, shown on a logarithmic scale, for three groups of representative reflections: strong (110, 200), medium (221, 051) and weak (730, 028). Each panel displays the integrated intensity $[I_{hkl}^{{\rm obs}}]$ with error bars as a function of $[{\log _{10}}B]$ . For strong reflections, intensities decrease at higher beam-monitor values due to detector saturation. Conversely, weak reflections exhibit low signal-to-noise ratios at low flux. Red circles indicate the absorber setting automatically selected for each reflection by the procedure used to optimize data quality for structural refinement.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 59| Part 4| August 2026| Pages 1224-1237

https://doi.org/10.1107/S1600576726006187

Open

access

Follow J. Appl. Cryst.

Search IUCr Journals		doi		Advanced search
Author		volume	page