Buy article online - an online subscription or single-article purchase is required to access this article.
Download citation
Download citation
link to html
During the process of growing diamond crystals via microwave plasma chemical vapor deposition (MPCVD), the substrate temperature will gradually increase with increasing growth time. At present, the commonly used method to compensate for the temperature increase is to reduce the deposition parameters (gas pressure and input power) or adjust the height of the susceptor. However, according to previous studies, reducing the substrate parameters will reduce the growth rate. In addition, adjusting the height of the susceptor may cause secondary plasma, which could damage the equipment. Therefore, it is necessary to find the reason for the substrate temperature increase with the growth time and eliminate it. Firstly, the effect of substrate size change on the substrate temperature was simulated dynamically, which indicated that the substrate size change was not the main reason for the continuous increase of the substrate temperature. Subsequent analysis showed that non-diamond carbon formed at the bottom of the grown diamond, which may cause a change of the thermal contact resistance. Therefore, a thermal contact resistance component was introduced into the existing model of diamond growth, and it was found that the substrate temperature increased with the roughness of the bottom of the substrate. In order to eliminate the influence of thermal contact resistance, a welding growth method was proposed with the aim of avoiding the accumulation of the non-diamond carbon at the bottom of the substrate. The growth with different welding materials showed that the grown diamond's internal stress distribution after welding growth was similar to that without welding growth, but the non-diamond carbon at the bottom was obviously restrained. However, the selection of welding materials needs to be further optimized with respect to the welding stability and growth rate.

Subscribe to Journal of Applied Crystallography

The full text of this article is available to subscribers to the journal.

If you have already registered and are using a computer listed in your registration details, please email support@iucr.org for assistance.

Buy online

You may purchase this article in PDF and/or HTML formats. For purchasers in the European Community who do not have a VAT number, VAT will be added at the local rate. Payments to the IUCr are handled by WorldPay, who will accept payment by credit card in several currencies. To purchase the article, please complete the form below (fields marked * are required), and then click on `Continue'.
E-mail address* 
Repeat e-mail address* 
(for error checking) 

Format*   PDF (US $40)
   HTML (US $40)
   PDF+HTML (US $50)
In order for VAT to be shown for your country javascript needs to be enabled.

VAT number 
(non-UK EC countries only) 
Country* 
 

Terms and conditions of use
Contact us

Follow J. Appl. Cryst.
Sign up for e-alerts
Follow J. Appl. Cryst. on Twitter
Follow us on facebook
Sign up for RSS feeds