|
|
|
Figure 1
Schematic diagram of the experimental arrangement for large-area X-ray diffraction topography. The 300 mm-wide monochromatic X-ray beam obtained at a point 200 m from the bending-magnet source was used to acquire topographs of a large-diameter silicon wafer sample. |


journal menu![[Figure 1]](wl0003fig1.jpg)



