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Figure 4
Reflectivities R(E) measured on the 225 Å Ni as-evaporated film (step 1); the oxidized film after 30 min annealing at 973 K in 60 mbar O2 (step 2); the film after reaction with the substrate induced by a long annealing (9 h) at 1273 K (step 3). The inset shows the angle-dependent reflectivity taken at 8 keV in step (1). The collection angles were 0.30° (marked by an arrow in the inset), 0.25° and 0.22° for steps (1), (2) and (3), respectively. The cusp-like shape in spectrum (1) is the distortion due to anomalous dispersion.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 10| Part 3| April 2003| Pages 260-264
doi:10.1107/S0909049503005582
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