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Figure 3
Relative change of the integrated areas of the νas(Si—O—Si) band (left axis) and Si—OH band (right axis) as a function of the exposure dose in silica sol–gel films. The lines are a visual guide only.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 18| Part 2| March 2011| Pages 280-286
https://doi.org/10.1107/S0909049510051666
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