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Figure 1
Stress induced by 30 bilayer Mo/Si ML coatings on a superpolished Si wafer using electron-beam deposition and varying the Mo fraction. Negative stress values correspond to compressive stress, positive values to tensile stress. The optimum Γ for ML-BSs on 50 nm SiRN is ∼0.63.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 20| Part 2| January 2013| Pages 249-257
doi:10.1107/S0909049512049990
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