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Figure 2
(a) Schematic of the P10 beamline and the GINIX endstation, with undulator (u29), double-crystal monochromator (mono), entrance slits (g1, g2) to the experimental hutches, fast shutter (fs), automated attenuators (att), KB clean-up slits (skb), the KB mirrors, the focal plane (F) and the detection plane (d), with the respective distances. (b) Close-up of the compound optical system with KB, beam selection aperture (ap), waveguide (WG), on-axis optical microscopes (mic, oav), an optional fluorescence detector (fluo), the cryojet sample environment (cryo), and the flight tube (ft) containing two beamstop holders (BS). (c) Electron micrograph of the sputtered thin-film sequence Ge/Mo/C/Mo/Ge used for the planar waveguide system (1DWG) (Krüger et al., 2012BB37). (d) The 1DWG as seen in the on-axis optical microscope with the relevant coupling region for the beam polished by a focused ion beam. (e) Schematic of a two-dimensional waveguide system (2DWG) realised by crossing two 1DWG slices. (f) Schematic of a lithographic waveguide channel (air) capped by wafer bonding (Neubauer et al., 2014BB49), with (g) a corresponding electron micrograph.

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