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Figure 1
FESEM images showing the morphology of overlayers obtained by X-ray irradiation from solution I in Table 1[link] on (a) glass, (b) SiO2 on Si, (c) TiN/Ti/SiO2/Si, (d) PMMA photoresist and (e) SU-8 photoresist. Scale bars: 10 µm.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 22| Part 6| September 2015| Pages 1524-1527
doi:10.1107/S1600577515015234
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