Figure 3
Conceptual sketch of the set-up used for the beam metrology experiments. The X-ray beam propagates from the virtual source position with a caustic profile. The jitter, due to the stochastic generation mechanism of the light, produces pointing instability on the beam. The spatial (transverse) coherence length across the beam is defined by Lcoh. When the beam encounters the mask in the near-field, the Fresnel diffraction occurs. The Fresnel pattern is acquired using the LiF crystal. The pattern is formed by internal (IF) and external (EF) fringe modulations. The beam information is extracted in the near-field from the internal pattern profile. The external pattern is used for a cross-validation. See text for detailed discussion. |