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Figure 2
SEM images of silicon substrates dipped in an aqueous Cu(CH3COO)2 solution spiked with ethanol and irradiated with X-rays from a synchrotron source for 5 min using an X-ray mask. (a) The well patterned surface and (b)–(f) CuO particles. |
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Figure 2
SEM images of silicon substrates dipped in an aqueous Cu(CH3COO)2 solution spiked with ethanol and irradiated with X-rays from a synchrotron source for 5 min using an X-ray mask. (a) The well patterned surface and (b)–(f) CuO particles. |