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Figure 2
SEM images of silicon substrates dipped in an aqueous Cu(CH3COO)2 solution spiked with ethanol and irradiated with X-rays from a synchrotron source for 5 min using an X-ray mask. (a) The well patterned surface and (b)–(f) CuO particles.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 24| Part 3| May 2017| Pages 653-660
https://doi.org/10.1107/S1600577517002314
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