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Figure 5
(a) Au 4f XPS spectra with different sputtering times: 0 min, 1 min, 15 min, 45 min and 105 min. (b) Pt 4f XPS spectra with different sputtering times: 0 min, 1 min, 15 min, 45 min and 105 min. (c) Variation of intensity as a function of sputtering time of the Au 4f7/2 XPS peak after background correction using a Shirley background and normalization with respect to the intensity after 105 min etching. (d) Variation of intensity as a function of sputtering time of the Pt 4f7/2 XPS peak after background correction using a Shirley background and normalization with respect to the intensity after 105 min etching.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 24| Part 4| July 2017| Pages 825-835
https://doi.org/10.1107/S1600577517006257
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