Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Siewert, F.; Löchel, B.; Buchheim, J.; Eggenstein, F.; Firsov, A.; Gwalt, G.; Kutz, O.; Lemke, S.; Nelles, B.; Rudolph, I.; Schäfers, F.; Seliger, T.; Senf, F.; Sokolov, A.; Waberski, C.; Wolf, J.; Zeschke, T.; Zizak, I.; Follath, R.; Arnold, T.; Frost, F.; Pietag, F.; Erko, A.

doi:10.1107/S1600577517015600

Journal of Synchrotron Radiation Journal of
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Figure 10
Ion beam etching. Calculated sputter rates of selected elements for sputter ions Ar⁺ and Xe⁺ at 1 keV sputter energy and 90° incidence angle of the ion beam to the surface. Si and Au are indicated by arrows.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 25| Part 1| January 2018| Pages 91-99

https://doi.org/10.1107/S1600577517015600

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