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Figure 13
Substrate topography of a Si substrate measured with the BESSY-NOM before (top) and after (bottom) ion beam treatment with Ar+ ions at a 90° sputter angle. The surface topography including the higher-spatial-frequency surface pattern remains unchanged.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 25| Part 1| January 2018| Pages 91-99
https://doi.org/10.1107/S1600577517015600
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