Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

Makhotkin, I.A.; Sobierajski, R.; Chalupský, J.; Tiedtke, K.; de Vries, G.; Störmer, M.; Scholze, F.; Siewert, F.; van de Kruijs, R.W.E.; Milov, I.; Louis, E.; Jacyna, I.; Jurek, M.; Klinger, D.; Nittler, L.; Syryanyy, Y.; Juha, L.; Hájková, V.; Vozda, V.; Burian, T.; Saksl, K.; Faatz, B.; Keitel, B.; Plönjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Nienhuys, H.-K.; Gwalt, G.; Mey, T.; Enkisch, H.

doi:10.1107/S1600577517017362

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Figure 10
XPS data inside and outside the Mo/Si l1n9 spot: (a) and (b) show the Si 2p and O 1s spectra measured in the spot position and at the distance of 0.75 and 8.3 mm from the centre of the irradiated spot. (c) shows the decomposition of Si 2p spectra, and (d) the atomic concentration of the elements versus distance from the irradiation centre.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 25| Part 1| January 2018| Pages 77-84

https://doi.org/10.1107/S1600577517017362

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