Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

Makhotkin, I.A.; Sobierajski, R.; Chalupský, J.; Tiedtke, K.; de Vries, G.; Störmer, M.; Scholze, F.; Siewert, F.; van de Kruijs, R.W.E.; Milov, I.; Louis, E.; Jacyna, I.; Jurek, M.; Klinger, D.; Nittler, L.; Syryanyy, Y.; Juha, L.; Hájková, V.; Vozda, V.; Burian, T.; Saksl, K.; Faatz, B.; Keitel, B.; Plönjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Nienhuys, H.-K.; Gwalt, G.; Mey, T.; Enkisch, H.

doi:10.1107/S1600577517017362

Journal of Synchrotron Radiation Journal of
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Figure 9
Oxygen content in the surface layer of the Ru film, determined by XPS mapping (a) and the simulated effect of this oxygen amount on the EUV reflectivity (b). The latter can be compared with EUV reflectivity shown in Fig. 5

. The uncertainties of measured atomic concentrations are smaller than their spatial variations over the unirradiated area.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 25| Part 1| January 2018| Pages 77-84

https://doi.org/10.1107/S1600577517017362

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