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Figure 3
Results of the imprint measurements of the focused FLASH beam (13.5 nm, 100 fs) around the interaction point inside the CAMP end-station. The beam was attenuated to different fractions of the initial fluence using a set of filters for each longitudinal position of the PMMA-coated silicon wafer (PMMA thickness 2.5 µm). Solid symbols show beam sizes measured by PMMA imprints, empty symbols show wavefront sensor measurements, and solid lines show the results of ray-tracing calculations. The measured Rayleigh length, i.e. the path along the beam where the beam waist is smaller than ![]() |
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