Deep X-ray lithography system with a uniform and high-accuracy fabrication area established in beamline BL11 at NewSUBARU

Takeuchi, M.; Yamaguchi, A.; Utsumi, Y.

doi:10.1107/S1600577518017939

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 2
Calculated X-ray beam spectrum at the exposure stage of BL11 for (a) different incident angles to the toroidal mirror with 1.5 GeV operation and (b) different operation energies with a storage current of 300 mA.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 2| March 2019| Pages 528-534

https://doi.org/10.1107/S1600577518017939

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