Deep X-ray lithography system with a uniform and high-accuracy fabrication area established in beamline BL11 at NewSUBARU

Takeuchi, M.; Yamaguchi, A.; Utsumi, Y.

doi:10.1107/S1600577518017939

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

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Figure 3
Calculated intensity distribution (a) before and (b) after the toroidal mirror and (c) at the deep X-ray lithography exposure stage; integrated photon numbers along the (d) vertical and (e) horizontal directions.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 2| March 2019| Pages 528-534

https://doi.org/10.1107/S1600577518017939

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