Deep X-ray lithography system with a uniform and high-accuracy fabrication area established in beamline BL11 at NewSUBARU

Takeuchi, M.; Yamaguchi, A.; Utsumi, Y.

doi:10.1107/S1600577518017939

Journal of Synchrotron Radiation Journal of
Synchrotron Radiation

IUCr IT WDC

home archive editors for authors for readers submit subscribe open access

view article

Figure 7
(a) Membrane mask. (b) Large-area patterning of the PMMA sheet by the proposed beam-scan method. (c) Coordinate of the measurement points. (d) Deviation of the measurement results for a 1.5 GeV operation. (e) Pattern fabricated with the 1.0 GeV operation. (f) PTFE dry etched with a 1.5 GeV operation.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 2| March 2019| Pages 528-534

https://doi.org/10.1107/S1600577518017939

Follow J. Synchrotron Rad.

Search IUCr Journals		doi		Advanced search
Author		volume	page