Figure 3
Angular dependences of the reflectivity with the rotated polarization (a) and the reflectivity difference (I+ − I−) (b), calculated for the ultrathin magnetic layer, placed at different distances from the Si substrate and magnetized along the beam. It is interesting to note that the peculiarities near the critical angle disappeared in the asymmetry angular dependence (I+ − I−)/(I+ + I−) due to the strong variations of the denominator (I+ + I−) in this region. |