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Figure 1
(a) Simplified layout of the NanoMAX, showing undulator, focusing mirrors, secondary source aperture (SSA), focusing mirrors (KB), the waveguide (WG) as a direct intensity probe in the focal plane, and the far-field detector. (b) 1DWG scan of the X-ray focus, fitted with two Gaussians with a 56 nm (FWHM) peak on a 155 nm background, for a horizontal SSA size of 10 µm. (c) Gaussian waist fits of a defocus series of 1DWG scans for one mirror pitch setting. (d) Minimum beam waists obtained from (b) for different mirror pitch angles, shown as a function of the corresponding longitudinal focal plane shift. Lower (red) values correspond to an SSA size (horizontal) of 10 µm, higher (blue) values show data for an SSA size of 40 µm.

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