Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

Lin, D.; Liu, Z.; Dietrich, K.; Sokolov, A.; Sertsu, M.G.; Zhou, H.; Huo, T.; Kroker, S.; Chen, H.; Qiu, K.; Xu, X.; Schäfers, F.; Liu, Y.; Kley, E.-B.; Hong, Y.

doi:10.1107/S1600577519008245

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Figure 10
Sketch of the primary grating patterns [i.e. patterns for an XVLSG, the grating vector of which is along the x axis; p(x) is the grating period at position x] and the horizontal and vertical stitching errors (periods indicated as p_h and p_v and grating vectors present along the x and z axes, respectively) on an EBL-written VLS phase mask.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 5| September 2019| Pages 1782-1789

https://doi.org/10.1107/S1600577519008245

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