Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

Lin, D.; Liu, Z.; Dietrich, K.; Sokolov, A.; Sertsu, M.G.; Zhou, H.; Huo, T.; Kroker, S.; Chen, H.; Qiu, K.; Xu, X.; Schäfers, F.; Liu, Y.; Kley, E.-B.; Hong, Y.

doi:10.1107/S1600577519008245

Journal of Synchrotron Radiation Journal of
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Figure 6
Simulated spectral resolving power of the optimized and fabricated gratings at the optimized and modified imaging planes, respectively. r_b is the optimized length of the exit arm, r_b′ is the optimized length of the exit arm according to the groove density distribution of the fabricated grating.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 26| Part 5| September 2019| Pages 1782-1789

https://doi.org/10.1107/S1600577519008245

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