view article

Figure 9
Time-dependent in situ measurement of CoOx-Pi electrochemical film deposition. (a) Plot of HEXS signal intensity at selected times during the continuous electrochemical deposition, as described in Fig. 7[link]. The scattering intensity was measured by the amplitude of the peak feature at q = 4.5 Å−1 and recorded for two positions along the ITO/GCA pore. The first position was placed just below the top edge of the ITO/GCA, the second 0.1 mm below this spot, shown as blue and red symbols, respectively. The X-ray beam was defined by 0.1 mm horizontal and 0.5 mm vertical slit apertures. (b) SEM image of CoOx-Pi film on the ITO/GCA electrode following 50 min of electrolysis, using the conditions described in Fig. 7[link]. The inset shows a field-of-view imaging of one of the ITO/GCA pores. The circle marks the area of enlargement shown on the right.

Journal logoJOURNAL OF
ISSN: 1600-5775
Follow J. Synchrotron Rad.
Sign up for e-alerts
Follow J. Synchrotron Rad. on Twitter
Follow us on facebook
Sign up for RSS feeds