Figure 9
Time-dependent in situ measurement of CoOx-Pi electrochemical film deposition. (a) Plot of HEXS signal intensity at selected times during the continuous electrochemical deposition, as described in Fig. 7. The scattering intensity was measured by the amplitude of the peak feature at q = 4.5 Å−1 and recorded for two positions along the ITO/GCA pore. The first position was placed just below the top edge of the ITO/GCA, the second 0.1 mm below this spot, shown as blue and red symbols, respectively. The X-ray beam was defined by 0.1 mm horizontal and 0.5 mm vertical slit apertures. (b) SEM image of CoOx-Pi film on the ITO/GCA electrode following 50 min of electrolysis, using the conditions described in Fig. 7. The inset shows a field-of-view imaging of one of the ITO/GCA pores. The circle marks the area of enlargement shown on the right. |