Two-stage reflective self-seeding scheme for high-repetition-rate X-ray free-electron lasers

Zhou, G.; Qu, Z.; Ma, Y.; Corbett, W.J.; Jiao, Y.; Li, H.; Qin, W.; Raubenheimer, T.O.; Tsai, C.-Y.; Wang, J.; Yang, C.; Wu, J.

doi:10.1107/S1600577520014824

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Figure 7
(a) Residual strain field for the first crystal in the second stage at 4.5 keV under heat load and (b) a zoom-in view near the XFEL footprint. The top, front and bottom surfaces are assumed thermally insulated and free of stress. All other surfaces are at constant temperature of 123 K and fixed in normal direction to simulate the mounting.

JOURNAL OF
SYNCHROTRON
RADIATION

ISSN: 1600-5775

Volume 28| Part 1| January 2021| Pages 44-51

https://doi.org/10.1107/S1600577520014824

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