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Figure 2
(a)–(d) First session of exposure and (e)–(h) second session of exposure. (a) and (e) Dose exposure protocol scheme; (b) and (f) ultralene substrate (U); (c) and (g) paraffin on Si3N4 (P-S); (d) and (h) paraffin on ultralene (P-U). For representation reasons, the corresponding exposed area for (c) is represented in (g) by rotating the images 90° clockwise. Panels (f), (g) and (h) (left column) are coloured in order to better highlight the exposed areas. The white scale bar represents 25 µm. The colour bar shows the transmission signal for all images.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
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