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Figure 1
A schematic layout of the 11C Micro-MX beamline. The components are an in-vacuum undulator insertion-device source (ID), a front-end moveable slit (FE slit), a DCM, the first HFM, a horizontal slit as a virtual source, and the second focusing vertical and horizontal mirrors as KB mirrors. The total distance is 29 m from the source to the sample point.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
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