Figure 1
A schematic layout of the 11C Micro-MX beamline. The components are an in-vacuum undulator insertion-device source (ID), a front-end moveable slit (FE slit), a DCM, the first HFM, a horizontal slit as a virtual source, and the second focusing vertical and horizontal mirrors as KB mirrors. The total distance is 29 m from the source to the sample point. |