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Figure 1
Si K-edge and Cu K-edge X-ray absorption near-edge structure spectra for oxidized Si (a) and oxidized Cu [by TEY (b) and CEY (c)], respectively. The oxide film thicknesses were 19 nm and 39 nm, respectively.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 28| Part 6| November 2021| Pages 1820-1824
https://doi.org/10.1107/S1600577521009401
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