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Figure 1
Schematic of an interference lithography setup using a binary grating mask. The first-order (m = ±1) beams form an aerial image at the image plane, a distance z1 from the mask, which is then transferred onto a photoresist. The zero-order (m = 0) and second-order (m = 2) diffracted beams are also shown.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
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