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Figure 3
Essential layout elements of the BAMline beamline at BESSY-II: source (WLS: wavelength shifter), monochromator (DMM). The W/Si DMM has 70 nm × 3.3 nm bi-layers, resulting in ΔE/E ≃ 3–4% in a wide energy range. Not shown: filters, slit systems, windows etc. [for details, see Markötter et al. (2018BB18)].

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 31| Part 6| November 2024| Pages 1551-1560
https://doi.org/10.1107/S1600577524008646
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