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Figure 2
(a) One of the fabricated 2 cm × 2 cm substrates containing 12 binary Huffman-like masks. Optical images of (b) a PN pair of the fabricated 32 × 32 binary Huffman-like mask with 8 µm resolution, (c) a fabricated 11 × 11 binary Huffman-like mask with 15 µm resolution, and (d) a fabricated 15 × 15 binary Huffman-like mask with 10 µm resolution. The scale bar shown in (b) also applies for the images (c) and (d).

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 32| Part 3| May 2025|
https://doi.org/10.1107/S1600577525002127
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